Hamden, CT, United States of America

Bruce Belcher

This inventor holds 1 USPTO granted patent. Top assignee: Kx Technologies LLC. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruce Belcher. Retrieved from https://idiyas.com/inventor/bruce-belcher-jjb17icn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Bruce Belcher: Innovator in Filtration Technology

Introduction

Bruce Belcher is a notable inventor based in Hamden, CT (US). He has made significant contributions to the field of filtration technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of filter cartridges.

Latest Patents

Bruce holds a patent for a "Filter cartridge with pre-filtration wrap retention through the use of ultrasonic scribing." This invention showcases his expertise in creating advanced filtration solutions. The patent reflects his commitment to improving product performance and reliability.

Career Highlights

Bruce is currently employed at Kx Technologies LLC, where he applies his knowledge and skills to develop cutting-edge filtration products. His work at Kx Technologies LLC has positioned him as a key player in the industry. He continues to push the boundaries of innovation in filtration technology.

Collaborations

Throughout his career, Bruce has collaborated with talented individuals such as Blake Savoy and Vincent Annetta. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

In summary, Bruce Belcher is a dedicated inventor whose work in filtration technology has made a significant impact. His innovative patent and contributions to Kx Technologies LLC highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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