San Jose, CA, United States of America

Brigitte C Stoehr


Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2002-2008

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7 patents (USPTO):

Title: Brigitte C. Stoehr: Innovator in Photomask Etching Technology

Introduction

Brigitte C. Stoehr is a prominent inventor based in San Jose, CA, known for her significant contributions to the field of photomask etching technology. With a total of 7 patents to her name, she has made remarkable advancements that enhance the precision and efficiency of semiconductor manufacturing processes.

Latest Patents

Among her latest patents is a multi-step process for etching photomasks. This method and apparatus are designed for etching a metal layer on a substrate, such as a photolithographic reticle. The process involves positioning the reticle on a support member in a processing chamber, where the reticle consists of a metal photomask layer on a silicon-based substrate, along with a patterned resist material. The etching process utilizes an oxygen-free processing gas followed by an oxygen-containing processing gas to achieve optimal results. Another notable patent focuses on etching silicon-based materials in substrates, such as photomasks, to create features with straight sidewalls, flat bottoms, and high profile angles. This innovative process minimizes polymer deposits on the substrate by maintaining the substrate at a reduced temperature and exciting the processing gas into a plasma state.

Career Highlights

Brigitte has established herself as a key figure in the semiconductor industry through her work at Applied Materials, Inc. Her expertise in photomask technology has positioned her as a leader in developing advanced etching techniques that are crucial for modern electronics.

Collaborations

Throughout her career, Brigitte has collaborated with talented professionals, including Melisa J. Buie and Michael D. Welch. These partnerships have fostered innovation and contributed to the success of her projects.

Conclusion

Brigitte C. Stoehr's contributions to photomask etching technology exemplify her dedication to innovation in the semiconductor industry. Her patents reflect her commitment to advancing manufacturing processes and enhancing the capabilities of photolithography.

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