Redford, MA, United States of America

Brian R Bennett


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Innovations by Brian R. Bennett: Pioneering High-Quality Silicon Dioxide Deposition

Introduction: Brian R. Bennett, an innovative inventor based in Redford, MA, has made significant contributions to the field of materials science through his unique invention. With a focus on semiconductor applications, he has developed a patent that enhances the deposition of high-quality silicon dioxide, a critical material in various electronic devices.

Latest Patents: Brian R. Bennett holds one impressive patent titled "Method for the deposition of high quality silicon dioxide at low temperatures." The invention entails a pyrolytic process for the deposition of silicon dioxide at temperatures ranging from 100°C to 330°C. By reacting silane and oxygen within a pressure range of 2-12 torr, the process achieves remarkable deposition rates—140 Å/min at 300°C and 50 Å/min at 120°C. Measurements of refractive index, field strength, and resistivity confirm the near-stoichiometric nature of the produced silicon dioxide, highlighting its potential for Group IV and Group III-V device applications.

Career Highlights: Brian's significant work is represented by the United States of America as represented by the Secretary of the Air Force, showcasing his dedication to advancing technology that supports defense and aerospace sectors. His innovative approaches and scientific rigor have positioned him as a noteworthy figure among inventors in his field.

Collaborations: Throughout his career, Brian R. Bennett has collaborated with esteemed colleagues such as Joseph P. Lorenzo and Kenneth Vaccaro. These partnerships have fostered an environment of creativity and technological development, allowing for the sharing of expertise and ideas that can lead to further breakthroughs.

Conclusion: Brian R. Bennett exemplifies the spirit of innovation through his pioneering work in silicon dioxide deposition. His contributions not only advance the field of materials science but also indicate a promising future for electronic device applications. With a dedicated career and valuable collaborations, Bennett continues to make an impact in the landscape of modern technology.

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