Williston, VT, United States of America

Brian Glogowski

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: The Burton Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Brian Glogowski. Retrieved from https://idiyas.com/inventor/brian-glogowski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Brian Glogowski: Innovator in Helmet Technology

Introduction

Brian Glogowski is an accomplished inventor based in Williston, Vermont. He is known for his innovative contributions to helmet technology, particularly through his patented design that enhances user comfort and safety.

Latest Patents

Glogowski holds a patent for an adjustable fitting helmet. This helmet features a body that defines a helmet interior, along with a fit system that engages the helmet to the wearer's head. Notably, at least the first and second portions of the fit system are movable independent of each other. A fit adjuster allows for the customization of the helmet's fit by varying characteristics such as size, shape, orientation, or pressure.

Career Highlights

Brian Glogowski is currently employed at The Burton Corporation, where he continues to innovate in the field of helmet design. His work has significantly impacted the safety and comfort of helmet users.

Collaborations

Glogowski has collaborated with notable coworkers, including John Darin Fiegener and Daniel Richard Armstrong, contributing to advancements in helmet technology.

Conclusion

Brian Glogowski's innovative work in adjustable fitting helmets showcases his commitment to enhancing safety and comfort for users. His contributions to The Burton Corporation and the field of helmet technology are commendable.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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