Boise, ID, United States of America

Brian Dolan


Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 63(Granted Patents)


Company Filing History:


Years Active: 2012-2019

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6 patents (USPTO):

Title: Brian Dolan: Innovator in Metal Removal Technologies

Introduction

Brian Dolan is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of integrated circuit fabrication, holding a total of 6 patents. His innovative methods for removing metal from substrates have advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Dolan's latest patents focus on methods of removing metal from a portion of a substrate. These methods involve exposing the substrate to a reducing environment that includes at least one reducing agent and one oxidizing agent. The process determines whether the remaining metal on the substrate is below a specific threshold. If the metal exceeds this level, the substrate is then exposed to an oxidizing environment with both oxidizing and reducing agents. This dual approach enhances the precision of metal removal, which is crucial in integrated circuit fabrication.

Career Highlights

Brian Dolan is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to apply his innovative ideas in a practical setting, contributing to the development of advanced technologies in metal removal.

Collaborations

Dolan has collaborated with talented coworkers, including Chan Lim and Robert J Hanson. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge solutions in the field.

Conclusion

Brian Dolan's contributions to metal removal technologies have made a significant impact on the semiconductor industry. His innovative methods and collaborative spirit continue to drive advancements in integrated circuit fabrication.

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