Apopaa, FL, United States of America

Brian David Crevasse


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Apopaa, FL (US) (2000)
  • Apopka, FL (US) (2001)

Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Brian David Crevasse: Innovator in Semiconductor Processing

Introduction

Brian David Crevasse is a notable inventor based in Apopka, FL (US). He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approaches to improving manufacturing techniques.

Latest Patents

One of his latest patents is titled "Process for photoresist rework to avoid sodium incorporation." This method focuses on stripping photoresist material from a semiconductor substrate while preventing the incorporation of sodium and other contaminant ions from a rework solvent. The process utilizes an oxygen and hydrogen plasma mixture to effectively strip the photoresist material without introducing significant amounts of oxygen into the titanium nitride layer. Any oxidation that occurs in the titanium nitride is reversed by exposing the substrate to an oxygen-free, reducing plasma, such as a hydrogen-containing plasma. This innovative approach ensures that the titanium nitride layer is less susceptible to contaminant ion incorporation during subsequent cleaning processes.

Another significant patent by Crevasse is the "Process of chemical-mechanical polishing and manufacturing an integrated." This polishing process aims to planarize a layer formed on a substrate and reduce thickness variations from substrate to substrate. The process employs a stable pad material for polishing, which is designed to have similar density, hardness, and compressibility as polyurethane, but is made from a different material. Alternative embodiments of the polishing pad material include hydrogenated nitrile compounds, fluoroelastomers, or perfluoroelastomers, selected for their compression, high tensile strength, wear resistance, and resistance to various chemicals.

Career Highlights

Brian David Crevasse is currently associated with Lucent Technologies Inc., where he continues to innovate in the semiconductor field. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Crevasse has collaborated with notable colleagues, including Simon John Molloy and Nace Layadi. These collaborations have further enhanced his contributions to the industry.

Conclusion

Brian David Crevasse is a distinguished inventor whose work in semiconductor processing has led to innovative patents that improve manufacturing techniques. His contributions continue to influence the field and drive advancements in technology.

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