This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2001-2002.
Company Filing History:
Years Active: 2001-2002
Title: Brian Boyle: Innovator in Semiconductor Cleaning Technologies
Introduction
Brian Boyle is a notable inventor based in San Francisco, CA, who has made significant contributions to the field of semiconductor technology. With a total of 2 patents, he has developed innovative methods for cleaning process chambers used in semiconductor deposition.
Latest Patents
Brian Boyle's latest patents include a "Computer readable medium for controlling a method of cleaning a process chamber" and a "Method for cleaning a process chamber." Both patents focus on the in situ cleaning of semiconductor deposition chambers, specifically for materials such as titanium and titanium nitride. The methods involve introducing chlorine gas into the chamber at elevated temperatures, purging the chamber with inert gas, and evacuating it before the introduction of the next wafer. A two-stage cleaning process is also described, which includes initiating a plasma without removing the chlorine and replenishing a thin protective film of titanium on the chamber's inner surfaces after each cleaning.
Career Highlights
Brian Boyle is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Brian has collaborated with notable colleagues such as Anand Vasudev and Toshio Itoh, contributing to advancements in semiconductor technologies.
Conclusion
Brian Boyle's innovative work in semiconductor cleaning technologies has positioned him as a key figure in the industry. His patents reflect a commitment to improving manufacturing processes and ensuring the quality of semiconductor materials.