Company Filing History:
1 out of 832,912 Years Active: 2023
Title: Innovator Spotlight: Brian Ahr and His Contribution to EUV Mask Inspection
Introduction: Brian Ahr, an accomplished inventor based in Milpitas, California, has made significant strides in the field of extreme ultraviolet (EUV) lithography. With a focus on enhancing the efficiency and accuracy of EUV mask inspections, Ahr has contributed valuable intellectual property to the industry.
Latest Patents: Brian Ahr holds a patent titled "Method and apparatus for EUV mask inspection." This innovative patent describes a method for producing a protective buffer flow in an EUV light source, along with an EUV mask inspection apparatus. The method entails directing light along a light path from the EUV light source toward a collector. A first buffer gas is injected through multiple through holes in the collector and directed away from its surface. Additionally, a second buffer gas is injected from a ring manifold arranged peripherally to the collector, ensuring the gases work in tandem to enhance the inspection process.
Career Highlights: Throughout his career, Brian Ahr has remained dedicated to advancing the technology associated with EUV lithography. With his patent, he demonstrates an innovative approach that could improve the operational efficiency and reliability of EUV mask inspections, which are critical in semiconductor manufacturing.
Collaborations: Brian has worked alongside talented colleagues, including Erel Milshtein and Alexander Bykanov. Together, they have contributed to research and development efforts, fostering an environment of collaboration that spurs innovation in the field.
Conclusion: Brian Ahr’s innovative work in EUV mask inspection underscores the importance of ongoing research and development in advanced lithography technologies. His patent serves as a noteworthy contribution to the industry, demonstrating how innovative solutions can enhance manufacturing processes in a rapidly evolving technological landscape.