The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2023
Filed:
Mar. 23, 2021
Kla Corporation, Milpitas, CA (US);
Erel Milshtein, Cupertino, CA (US);
Alexander Bykanov, Milpitas, CA (US);
Konstantin Tsigutkin, Milpitas, CA (US);
Lauren Wilson, Milpitas, CA (US);
Lubomyr Kucher, Milpitas, CA (US);
Brian Ahr, Milpitas, CA (US);
Maksim Alexandrovich Deminskii, Moscow, RU;
Leonid Borisovich Zvedenuk, Moscow, RU;
Aleksandr Vladimirovich Lebedev, Moscow, RU;
Andrey Evgenievich Stepanov, Moscow, RU;
Other;
Abstract
A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.