Norwood-Young America, MN, United States of America

Brent D Carlson


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Introduction

Brent D Carlson, an accomplished inventor based in Norwood-Young America, Minnesota, has made significant contributions to the field of semiconductor manufacturing. With a unique focus on improving wafer treatment processes, his innovations have the potential to enhance production efficiency and quality in the technology sector.

Latest Patents

Carlson holds a patent for a "Low Haze Wafer Treatment Process." This innovative process addresses the challenge of removing multiple layers of different materials from a substrate with a silicon material base. Notably, one of these layers is silicon oxide, and another comprises a metal layer situated above the silicon oxide. The patented method involves treating the substrate with a series of chemical formulations that work in succession to effectively remove these layers until the silicon material base is fully exposed. A crucial step in this process is the use of HF treatment to eliminate the silicon oxide layer, enabling optimal preparation for subsequent manufacturing stages.

Career Highlights

Brent D Carlson is currently associated with FSI International, Inc., a prominent player in the semiconductor equipment industry. His role within the company highlights his dedication to pushing the boundaries of innovation in wafer treatment technology. Throughout his career, Carlson has focused on refining processes that lead to superior semiconductor manufacturing outputs.

Collaborations

Collaboration is key to Carlson's success, as evidenced by his work alongside talented colleagues such as Erik D Olson and James R Oikari. Their collective expertise in the field has fostered an environment conducive to innovation and technological advancement. Together, they have contributed to the growth and development of efficient wafer treatment processes that meet the ever-evolving demands of the semiconductor market.

Conclusion

Brent D Carlson stands out as a key innovator in the realm of wafer treatment processes. His patent for the low haze wafer treatment process reflects a significant advancement in the field, demonstrating his commitment to enhancing technology and manufacturing quality. The collaborative efforts with his colleagues further emphasize the importance of teamwork in driving innovation. As the semiconductor industry continues to evolve, Carlson’s work paves the way for future advancements and efficiencies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…