Bradley A Omer

Title: The Innovations of Bradley A Omer

Introduction

Bradley A Omer is a notable inventor based in Fairfax, Vermont. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to trench contact silicides.

Latest Patents

Omer holds a patent for a "Silicided trench contact to buried conductive layer." This invention involves forming a trench contact silicide on the inner wall of a contact trench that reaches a buried conductive layer in a semiconductor substrate. The purpose of this innovation is to reduce parasitic resistance in a reachthrough structure. The trench contact silicide is strategically formed at the bottom, on the sidewalls of the trench, and on a portion of the top surface of the semiconductor substrate. Following this, the trench is filled with a middle-of-line (MOL) dielectric. A contact via may be created on the trench contact silicide, which can be formed through a single silicidation reaction with a metal layer or through multiple silicidation reactions with various metal layers. Omer's patent represents a significant advancement in semiconductor manufacturing processes.

Career Highlights

Bradley A Omer is associated with the International Business Machines Corporation (IBM), where he has been able to apply his expertise in semiconductor technology. His work at IBM has allowed him to contribute to various projects and innovations in the tech industry.

Collaborations

Omer has collaborated with notable colleagues such as Douglas Duane Coolbaugh and Jeffrey Bowman Johnson. These collaborations have likely enriched his work and contributed to the advancements in their respective fields.

Conclusion

Bradley A Omer's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of more efficient semiconductor manufacturing processes.