Haifa, Israel

Boris Shvartsev

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Location History:

  • Haifa, IL (2020)
  • Pardes Hanna-Karkur, IL (2023)

Company Filing History:


Years Active: 2020-2023

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2 patents (USPTO):Explore Patents

Title: Innovations by Boris Shvartsev

Introduction

Boris Shvartsev is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of materials science, particularly in the activation of metal surfaces and electrochemical applications. With a total of 2 patents, his work has implications for various industrial processes.

Latest Patents

One of Boris Shvartsev's latest patents is titled "Method for Passive Metal Activation and Uses Thereof." This patent discloses a method for activating the surface of metals, including self-passivated metals, using a fluoroanion-containing composition. Additionally, it describes an electrochemical cell that utilizes an aluminum-containing anode material and a fluoroanion-containing electrolyte, characterized by high efficiency and low corrosion. The patent also outlines a process for fusing self-passivated metals at relatively low temperatures and ambient atmospheres, as well as a method for electrodepositing metal on self-passivated metals using a metal-oxide source.

Career Highlights

Boris Shvartsev is associated with the Technion Research & Development Foundation Limited, where he has been involved in various innovative projects. His expertise in materials science has allowed him to explore new methods for enhancing metal activation and electrochemical processes.

Collaborations

Throughout his career, Boris has collaborated with notable colleagues, including Yair Ein-Eli and Danny Gelman. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Boris Shvartsev's innovative work in metal activation and electrochemical applications showcases his significant contributions to materials science. His patents reflect a commitment to advancing technology in this field, and his collaborations further enhance the impact of his research.

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