Seoul, South Korea

Boo Y L Park

This inventor holds 1 USPTO granted patent. Top assignee: Dada Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Boo Y L Park. Retrieved from https://idiyas.com/inventor/boo-y-l-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations by Boo Y L Park

Introduction

Boo Y L Park is an inventive mind based in Seoul, South Korea. He has made significant contributions to the field of wearable technology, particularly with his innovative designs that cater to user comfort and functionality.

Latest Patents

One of his notable patents is a "Cap with Hidden Teeth." This baseball-style cap is designed to accommodate wearers with a range of head sizes without the need for a separate sizing mechanism. The cap features a crown main body that is expandable in the peripheral direction, along with a headband made from a substantially non-stretchable fabric material. The headband is connected to the lower peripheral edge of the crown main body by a piece of stretchable fabric, which is sewn to cover the headband. The lower peripheral edge of the headband is incised or grooved at regular intervals, allowing it to demonstrate a teeth appearance when a stretching force is applied in the peripheral direction.

Career Highlights

Boo Y L Park is associated with Dada Corporation, where he continues to innovate and develop new products. His work reflects a commitment to enhancing user experience through practical design solutions.

Conclusion

Boo Y L Park's contributions to the field of wearable technology exemplify the spirit of innovation. His patented cap design showcases his ability to blend functionality with comfort, making a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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