Suwon, South Korea

Bonhyun Gu

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bonhyun Gu. Retrieved from https://idiyas.com/inventor/bonhyun-gu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Bonhyun Gu: Innovator in Semiconductor Manufacturing

Introduction

Bonhyun Gu is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative approaches that leverage machine learning.

Latest Patents

Gu holds a patent for a method verifying process proximity correction using machine learning, along with a semiconductor manufacturing method utilizing the same. This patent outlines a comprehensive process for manufacturing a semiconductor chip, which includes generating a layout pattern, performing Process Proximity Correction (PPC) on the layout pattern, and verifying the PPC layout pattern using machine learning. The process further involves performing Optical Proximity Correction (OPC) and manufacturing a mask to create the semiconductor chip.

Career Highlights

Bonhyun Gu is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Gu collaborates with talented colleagues, including Seorim Moon and Sooyong Lee, contributing to a dynamic and innovative work environment.

Conclusion

Bonhyun Gu's contributions to semiconductor manufacturing through his innovative patent demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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