Suwon, South Korea

Bongki Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bongki Park. Retrieved from https://idiyas.com/inventor/bongki-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Bongki Park - Innovator in Chemical Mechanical Polishing Technology

Introduction

Bongki Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative approach has led to the development of a unique cleaning apparatus that enhances the efficiency and effectiveness of CMP processes.

Latest Patents

Bongki Park holds a patent for a "Cleaner for Chemical Mechanical Polishing Apparatus." This invention includes a cleaning body, multiple cleaning nozzles, a vision system, and a controller. The cleaning body is strategically positioned under the polishing head of the CMP apparatus, which is designed to hold a substrate. It is configured to receive a cleaning solution that effectively cleans the polishing head. The cleaning nozzles are arranged to inject the cleaning solutions onto the polishing head. The vision system captures images of the polishing head to ensure precise application of the cleaning solution. The controller is capable of individually regulating the amounts of cleaning solutions injected based on the images obtained. This innovative design helps prevent scratches caused by defects on the substrate.

Career Highlights

Bongki Park is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in improving the performance and reliability of CMP processes.

Collaborations

Bongki Park has collaborated with talented colleagues such as Jubong Lee and Jongsu Kim. Their combined expertise has contributed to advancements in CMP technology and has fostered a collaborative environment that encourages innovation.

Conclusion

Bongki Park is a distinguished inventor whose work in chemical mechanical polishing technology has made a significant impact in the industry. His innovative cleaning apparatus exemplifies the importance of advancements in semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…