Bomei Tan

Title: Bomei Tan: Innovator in Chemical-Mechanical Polishing Slurry

Introduction

Bomei Tan is a notable inventor based in Tianjin, China. He has made significant contributions to the field of chemical-mechanical polishing, particularly in the development of slurries used for high precision finishing of sapphire surfaces. His innovative approach has led to advancements that benefit various industrial applications.

Latest Patents

Bomei Tan holds a patent for a slurry designed for chemical-mechanical planarization of sapphire. The patent describes an aqueous chemical-mechanical polishing slurry that includes a chelating agent with 13 chelate rings, which has a strong affinity for complexing with aluminum ions. This slurry achieves a removal rate of 10-16 µm/h and reduces surface roughness to 0.1 nm. The components of the slurry include silica sol, alkali modifier, ether-alcohol activator, chelating agent, and deionized water, all contributing to its effectiveness and environmental safety.

Career Highlights

Throughout his career, Bomei Tan has focused on creating solutions that enhance the efficiency and effectiveness of sapphire surface finishing. His work has been recognized for its low cost and high performance, making it a valuable asset in industrial applications.

Collaborations

Bomei Tan has collaborated with notable colleagues such as Shengli Wang and Jingye Kang. Their combined expertise has contributed to the successful development and implementation of innovative polishing solutions.

Conclusion

Bomei Tan's contributions to the field of chemical-mechanical polishing have established him as a key inventor in the industry. His patented slurry technology not only meets industrial requirements but also promotes environmental sustainability.