Shanghai, China

Bofang Peng


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Bofang Peng: Innovator in Overlay Error Detection

Introduction

Bofang Peng is a notable inventor based in Shanghai, China. He has made significant contributions to the field of optical measurement technology. His innovative work focuses on enhancing the accuracy of overlay error detection in various applications.

Latest Patents

Bofang Peng holds a patent for a "Device and method for detecting overlay error." This device comprises a light source, an illumination system, an objective lens, and a detector. The light source generates measurement light beams, which are directed by the illumination system into the objective lens. The objective lens then focuses these beams onto an overlay marker, collecting the main maximums of the diffracted light beam. The detector, positioned on the pupil plane of the objective lens, detects the position of each main maximum of the diffracted light beam. This information is crucial for measuring the overlay error of the overlay marker. The measurement signals obtained are not influenced by factors such as illumination uniformity or transmissivity uniformity.

Career Highlights

Bofang Peng is currently employed at Shanghai Micro Electronics Equipment (Group) Co., Ltd. His work at this company has allowed him to apply his expertise in optical measurement technology. He has been instrumental in developing solutions that improve measurement accuracy in the semiconductor industry.

Collaborations

Bofang Peng collaborates with talented individuals such as Hailiang Lu and Fan Wang. Their combined efforts contribute to advancements in the field of optical measurement and error detection.

Conclusion

Bofang Peng's innovative contributions to overlay error detection demonstrate his commitment to advancing technology in the semiconductor industry. His patent reflects a significant step forward in improving measurement accuracy.

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