Bo-Yang Chen

Title: Bo-Yang Chen: Innovator in Multi-Patterning Lithography

Introduction

Bo-Yang Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit design, particularly in the area of multi-patterning lithography. His innovative approach has led to the development of a patented method that addresses complex challenges in this domain.

Latest Patents

Bo-Yang Chen holds a patent titled "Method, system, and storage medium for resolving coloring conflict in multi-patterning lithography." This patent describes a method performed by at least one processor that includes accessing a layout of an integrated circuit (IC) with multiple patterns across one or more layers. The process involves performing a coloring operation, forming a list of uncolorable cell groups (UCGs), and refining the layout through specific movements and determinations of colorability. This innovative method enhances the efficiency and effectiveness of IC design.

Career Highlights

Bo-Yang Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving lithography techniques, which are crucial for the production of advanced integrated circuits. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Bo-Yang Chen has collaborated with notable colleagues, including Chi-Chun Fang and Wai-Kei Mak. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Bo-Yang Chen's contributions to multi-patterning lithography exemplify the impact of innovation in the semiconductor industry. His patented methods not only address existing challenges but also pave the way for future advancements in integrated circuit design.