This inventor holds 1 USPTO granted patent. Top assignee: Everlight USA, Inc.. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Bo-Nan Lin: Patent Inventor in Photosensitive Resin Technology.
Introduction
Bo-Nan Lin is an inventor associated with Taoyuan, Taiwan. His patent work includes a black photosensitive resin composition designed for use in light-blocking layers, including applications in touch panels.
Latest Patents
Lin is credited with 1 patent: “Black Photosensitive Resin Composition and Light-Blocking Layer Using the Same.” The invention describes a composition containing polysiloxane, black pigment, alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. It is designed to meet optical-density requirements and withstand high temperatures. The patent also describes a light-blocking layer manufactured using the composition.
Career Highlights
The provided information associates Lin with Everlight USA, Inc. His patent focuses on materials intended to support light-blocking performance and durability in touch-panel applications.
Collaborations
Lin’s listed coworkers include Fan-Sen Lin and Chih-Yi Chang.
Conclusion
Bo-Nan Lin’s patent work centers on a black photosensitive resin composition and its use in durable, high-optical-density light-blocking layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile