Bo-Hsiung Lei

Title: Bo-Hsiung Lei: Innovator in Silicon Dioxide Film Production

Introduction

Bo-Hsiung Lei is a prominent inventor based in Jia-yih, Taiwan. He has made significant contributions to the field of materials science, particularly in the production of silicon dioxide films. His innovative approach has led to advancements in the manufacturing processes used in various industries.

Latest Patents

Bo-Hsiung Lei holds a patent for the "Mass production of silicon dioxide film by liquid phase deposition method." This patent describes a method for mass-producing substantially uniform silicon dioxide films on wafers. The process involves forming wafer sets from at least four wafers, which are then placed in a slotted polytetrafluoroethylene polymer boat. A proper and short distance is maintained between the front surface of a wafer and another surface. Ultimately, a uniform silicon dioxide film is deposited on the wafer surfaces by contacting the wafer sets with an aqueous supersaturated silicon dioxide solution, which consists of a mixture of hydrofluosilicic acid and boric acid. This innovative method enhances the efficiency and quality of silicon dioxide film production.

Career Highlights

Bo-Hsiung Lei is affiliated with the National Science Council, where he continues to contribute to research and development in his field. His work has garnered attention for its practical applications and potential impact on technology.

Collaborations

One of his notable collaborators is Ming-Kwei Lee, with whom he has worked on various projects related to silicon dioxide film production.

Conclusion

Bo-Hsiung Lei's contributions to the field of silicon dioxide film production exemplify the importance of innovation in materials science. His patented methods are paving the way for advancements in manufacturing processes, showcasing the potential for further developments in this area.