Sindelfingen, Germany

Blanka Ivancic

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Blanka Ivancic. Retrieved from https://idiyas.com/inventor/blanka-ivancic

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Blanka Ivancic: Innovator in Polysilicon Technology

Introduction

Blanka Ivancic is a notable inventor based in Sindelfingen, Germany. She has made significant contributions to the field of polysilicon technology, particularly through her innovative methods for adjusting edge angles in polysilicon layers. Her work has implications for various applications in the semiconductor industry.

Latest Patents

Ivancic holds a patent for a method of adjusting the edge angle in polysilicon. This invention relates to a technique for modifying the steepness of edge angles in openings etched in a polysilicon layer. The method involves a pre-treatment of the polysilicon layer using a mixture of 5 parts water, 1 to 3 parts ammonia, and 0.25 to 1 part hydrogen peroxide. This pre-treatment is optimally conducted at temperatures ranging from 40°C to 70°C. She has 1 patent to her name.

Career Highlights

Blanka Ivancic is currently employed at International Business Machines Corporation, commonly known as IBM. Her role at IBM allows her to further her research and development in advanced materials and semiconductor technologies.

Collaborations

Throughout her career, Ivancic has collaborated with esteemed colleagues, including Wolfgang Augstein and Peter U Frasch. These collaborations have enriched her work and contributed to advancements in her field.

Conclusion

Blanka Ivancic is a pioneering inventor whose work in polysilicon technology showcases her innovative spirit and dedication to advancing semiconductor applications. Her contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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