This inventor holds 1 USPTO granted patent. Top assignee: Asm America, Inc.. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Innovations by Blake Samuels in CVD Process Technology.
Introduction
Blake Samuels is an accomplished inventor based in Scottsdale, AZ (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative designs focus on improving the efficiency and longevity of CVD process components.
Latest Patents
Blake Samuels holds a patent for a "Long life high temperature process chamber." This invention features a horizontally-oriented quartz CVD chamber with front and rear chamber divider plates. These plates are positioned adjacent to a centrally located susceptor and a surrounding temperature control ring, effectively dividing the chamber into upper and lower regions. The design aims to enhance the lifetime of CVD process components while improving throughput. A getter plate is strategically placed downstream from the susceptor to attract unused reactant gas, minimizing deposition on chamber walls and enhancing cleaning efficiency. Additionally, reradiating elements are incorporated to heat cooler areas of the chamber, and all critical components are made of solid chemical vapor deposited SiC to extend the chamber's life. Thermocouples with SiC sheaths are also included to withstand more process cycles than quartz sheaths.
Career Highlights
Blake Samuels is currently employed at Asm America, Inc., where he continues to innovate in the field of CVD technology. His work has led to significant advancements in the efficiency and reliability of CVD processes.
Collaborations
Blake collaborates with notable colleagues, including John F. Wengert and Ivo Johannes Raaijmakers. Their combined expertise contributes to the ongoing development of cutting-edge technologies in the industry.
Conclusion
Blake Samuels is a pioneering inventor whose work in CVD process technology has led to significant advancements in the field. His innovative designs and collaborative efforts continue to shape the future of chemical vapor deposition.
