Trondheim, Norway

Bjørn Ove Fimland


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Bjørn Ove Fimland: Innovator in Nanotechnology

Introduction

Bjørn Ove Fimland is an accomplished inventor based in Trondheim, Norway. With two notable patents to his name, his work primarily focuses on the advancement of nanotechnology, particularly in the growth of nanowires and nanopyramids.

Latest Patents

Fimland's latest patents involve a sophisticated process for growing nanowires or nanopyramids on graphitic substrates. The innovative process includes two main steps:

(I) Providing a graphitic substrate and depositing aluminum gallium nitride (AlGaN), indium gallium nitride (InGaN), aluminum nitride (AlN), or aluminum gallium indium nitride (AlGa(In)N) on the substrate at an elevated temperature to create a buffer layer or nanoscale nucleation islands.

(II) Growing a plurality of semiconducting group III-V nanowires or nanopyramids, specifically favoring III-nitride structures, on the aforementioned buffer layer or nucleation islands via metal-organic vapor phase epitaxy (MOVPE) or molecular beam epitaxy (MBE).

Career Highlights

Fimland has made significant contributions through his work at leading organizations, including Crayonano AS and the Norwegian University of Science and Technology (NTNU). His experience in both industrial and academic settings has greatly enhanced his expertise in nanotechnology.

Collaborations

Throughout his career, Bjørn Ove Fimland has collaborated with notable individuals, including Dong Chul Kim and Ida Marie Høiaas. These collaborations have allowed for the exchange of ideas and advancements in the field of semiconductor technology.

Conclusion

Bjørn Ove Fimland exemplifies innovation in the realm of nanotechnology, particularly through his groundbreaking processes for growing nanowires and nanopyramids. As he continues to work with prominent companies and collaborate with skilled professionals, his contributions to the field are likely to expand, paving the way for new advancements and applications in materials science.

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