This inventor holds 1 USPTO granted patent. Top assignees: Centre National De La Recherche Scientifique, Electronic Navigation Research Institute Independent Administrative Institution, Université De Nice Sophia Antipolis. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2010
Title: Binh Duong Nguyen: Innovator in Reflectarray Technology
Introduction
Binh Duong Nguyen is a notable inventor based in Vung Tau, Vietnam. He has made significant contributions to the field of radar technology, particularly through his innovative patent related to reflectarray systems.
Latest Patents
Nguyen holds a patent for a reflectarray and a millimeter wave radar. The reflectarray consists of an array of patch elements, where each patch element features a cut ring shape formed of a conductive ring with at least one crossing gap. The design allows for specific adjustments to the outer diameter, inner diameter, and crossing gap, ensuring that the phase shift defined by certain relations is different from zero. This innovation enhances the performance of radar systems by optimizing the phase of the reflected waves.
Career Highlights
Throughout his career, Nguyen has worked with prestigious organizations such as the Centre National De La Recherche Scientifique and the Electronic Navigation Research Institute Independent Administrative Institution. His experience in these institutions has contributed to his expertise in radar technology and innovation.
Collaborations
Nguyen has collaborated with notable colleagues, including Claire Blandine Migliaccio and Christian Yves Dominique Pichot Du Mezeray. These partnerships have likely enriched his research and development efforts in the field.
Conclusion
Binh Duong Nguyen is a distinguished inventor whose work in reflectarray technology has the potential to advance radar systems significantly. His contributions reflect a commitment to innovation and excellence in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile