Beijing, China

Bing Deng

This inventor holds 1 USPTO granted patent. Top assignee: Peking University. Active years: 2023.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Bing Deng in Graphene Technology

Introduction

Bing Deng is a prominent inventor based in Beijing, China. He has made significant contributions to the field of materials science, particularly in the development of graphene technologies. His innovative approach has led to advancements that are both efficient and cost-effective.

Latest Patents

Bing Deng holds a patent for a method titled "Method for manufacturing suspended graphene support film by selectively etching growth substrate." This invention discloses a process for preparing suspended graphene support film without the need for a transfer process. The method is efficient, low in cost, and allows for the preparation of graphene support films in a single etching step. The resulting films exhibit a controllable number of layers, high intactness ranging from 90% to 97%, and a large suspended area with diameters between 10 to 50 micrometers. Additionally, the films can be mass-produced and are suitable for use as transmission electron microscope support films, enabling high-resolution imaging of nanoparticles.

Career Highlights

Bing Deng is affiliated with Peking University, where he continues to engage in cutting-edge research. His work has garnered attention for its practical applications in various scientific fields.

Collaborations

Bing Deng has collaborated with notable colleagues, including Hailin Peng and Liming Zheng. Their joint efforts contribute to the advancement of graphene research and its applications.

Conclusion

Bing Deng's innovative work in graphene technology exemplifies the potential of modern materials science. His contributions not only enhance the understanding of graphene but also pave the way for future advancements in the field.

Profile summary based on public USPTO records.
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