Lexington, SC, United States of America

Bin Zhang


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Celebrating Innovation: The Contributions of Inventor Bin Zhang

Introduction

Bin Zhang, an accomplished inventor based in Lexington, SC, has made significant strides in the realm of semiconductor technology. With one patent to his name, he has contributed to advancements that could enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Zhang's notable patent pertains to a "Semiconductor and Template for Growing Semiconductors." This innovative template involves an AGN substrate on which a first layer of Group III nitrides is grown. Following this, a thin metal layer is deposited and annealed to create a pattern of islands. The process continues with an etching procedure to transfer this pattern into the first layer, ultimately allowing for the deposition of a second Group III nitride layer. This layer coalesces over the gaps in the island pattern, resulting in a smooth surface with low defect density suitable for growing a Group III semiconductor device. The methodology may involve using chlorine gas for etching, and the removal of excess gold with aqua regia.

Career Highlights

Bin Zhang is currently affiliated with Nitek, Inc., where he has been instrumental in developing technology that pushes the boundaries of semiconductor manufacturing. His focus on creating high-quality templates for growing semiconductors reflects a keen understanding of both theoretical and practical aspects of materials science.

Collaborations

Zhang works alongside talented colleagues, including Vinod Adivarahan and Asif Khan. Their collaboration signifies a robust team environment at Nitek, Inc. and enhances the innovative potential of projects in which they are involved.

Conclusion

With a keen innovative spirit and a strong background in semiconductor technology, Bin Zhang exemplifies the cutting-edge work being done in the field. His contributions not only advance current methodologies but also pave the way for future developments in the semiconductor industry.

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