Miaoli, Taiwan

Biing-Hwang Lin

This inventor holds 2 USPTO granted patents. Top assignee: Ritek Corporation. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Biing-Hwang Lin. Retrieved from https://idiyas.com/inventor/biing-hwang-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Biing-Hwang Lin: Innovator in Optical Recording Technologies

Introduction

Biing-Hwang Lin is a notable inventor based in Miaoli, Taiwan. He has made significant contributions to the field of optical recording technologies. With a total of 2 patents, Lin's work has advanced the methods and materials used in optical media.

Latest Patents

Lin's latest patents include an innovative optical recording medium and a method for making the same. This patent describes a method for fabricating an optical recording medium by forming a dye layer on a molded substrate through spin-coating. A reflection layer is then created on the dye layer via sputtering, ensuring that the optical disc achieves an adequate reflection rate. The dye layer consists of a cyanine type dye and an azo metal chelate compound, which enhances the optical properties of the medium.

Another significant patent focuses on a method and structure for intensifying track seeking signals from an optical disk, particularly for recordable digital versatile disks (DVD-R). By incorporating an optical correction layer between the dye material layer and the reflection layer, track-seeking signals are intensified, thereby improving the recording quality of the optical disk. This optical correction layer is made from inorganic materials and is formed over the dye material layer through a sputtering process.

Career Highlights

Biing-Hwang Lin is associated with Ritek Corporation, a leading company in the optical media industry. His work at Ritek has positioned him as a key player in the development of advanced optical recording technologies.

Collaborations

Lin has collaborated with notable coworkers, including Hui-Jen Chen and Hsin-Te Kuo, contributing to the innovative projects at Ritek Corporation.

Conclusion

Biing-Hwang Lin's contributions to optical recording technologies have significantly impacted the industry. His innovative patents and work at Ritek Corporation highlight his role as a leading inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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