Gyeongsangbuk-do, South Korea

Beung-Ilwa Jeong

This inventor holds 1 USPTO granted patent. Top assignee: Lg Display Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Beung-Ilwa Jeong. Retrieved from https://idiyas.com/inventor/beung-ilwa-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Beung-Ilwa Jeong and LCD Array Substrate Innovation

Introduction

Beung-Ilwa Jeong is an inventor associated with Gyeongsangbuk-do, South Korea, and LG Display Co., Ltd. His listed patent concerns a layered metal structure for an array substrate used in liquid crystal display (LCD) devices.

Latest Patents

Jeong is credited with 1 patent: “Array Substrate for LCD Device Having Double-Layered Metal Structure and Manufacturing Method Thereof.” The invention describes an LCD array substrate with gate electrodes, lines, and pads formed from aluminum or aluminum alloy paired with a barrier metal layer. Its data lines, source and drain electrodes, and data pads use a barrier metal layer alongside copper. The design also includes gate insulation, active and ohmic contact layers, a passivation layer, and transparent conductive material for the pixel electrode and pad terminals.

Career Highlights

The available information associates Jeong’s patent work with LG Display Co., Ltd. His listed invention addresses the construction and manufacture of layered conductive components in LCD array substrates.

Collaborations

Jin-Young Kim and Gyoo-Chul Jo are identified as Jeong’s coworkers. The supplied information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Beung-Ilwa Jeong’s listed patent focuses on a double-layered metal structure for LCD array substrates, reflecting his documented connection to display technology innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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