Berthold Ferstl

Title: Berthold Ferstl: Innovator in Semiconductor Cleaning Solutions

Introduction

Berthold Ferstl is a notable inventor based in Bensheim, Germany. He has made significant contributions to the field of cleaning compositions, particularly for products used in the semiconductor industry. With a total of 2 patents to his name, Ferstl's work is recognized for its innovative approach to enhancing cleaning processes.

Latest Patents

Ferstl's latest patents include a composition comprising a primary and a secondary surfactant for cleaning or rinsing products. This composition features an ionic compound with fluoroalkyl groups as the primary surfactant and a non-ionic compound with polyalkyloxy and/or polyalkylenoxy groups as the secondary surfactant. It is specifically designed for cleaning products used in the semiconductor industry. Additionally, he has developed an aqueous alkaline etching and cleaning composition for treating silicon substrates. This composition includes a quaternary ammonium hydroxide and various water-soluble acids and their salts, aimed at improving the treatment of silicon surfaces.

Career Highlights

Ferstl is currently employed at BASF SE Corporation, where he continues to innovate in the field of cleaning solutions. His work has been instrumental in advancing methods for cleaning and etching silicon substrates, which are crucial in the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Ferstl has collaborated with notable colleagues such as Simon Braun and Achim Fessenbecker. These partnerships have contributed to the development of effective cleaning compositions and methods.

Conclusion

Berthold Ferstl's contributions to the semiconductor industry through his innovative cleaning solutions highlight his expertise and commitment to advancing technology. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and offer practical solutions for improved processes.