Basf Se Corporation

Berthold Ferstl

Andreas Klipp

Achim Fessenbecker

Simon Braun

I Chen Chou

Achim Feßenbecker

Ferstl Berthold

Described is a composition comprising as primary surfactant an ionic compound comprising one or more fluoroalkyl groups and as secondary surfactant at least one non-ionic compound comprising one or more polyalkyloxy and/or polyalkylenoxy groups, for cleaning or rinsing a product, preferably a product used in the semiconductor industry, and a respective use of said composition. Further described is a method of making a cleaned or rinsed product, preferably a product used in the semiconductor industry, comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below, comprising the step of cleaning or rinsing said product with the composition of the invention.

Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product

An aqueous alkaline etching and cleaning composition for treating the surface of silicon substrates, the said composition comprising: (A) a quaternary ammonium hydroxide; and (B) a component selected from the group consisting of water-soluble acids and their water-soluble salts of the general formulas (I) to (V): (R&#x2014;S0-)X(I), R&#x2014;P0(X)(II); (RO&#x2014;S0-)X(III), RO&#x2014;P0(X), (IV), and [(RO)P0]X(V); wherein the n=1 or 2; X is hydrogen or alkaline or alkaline-earth metal; the variable R1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is Ror an alkylaryl moiety; the use of the composition for treating silicon substrates, a method for treating the surface of silicon substrates, and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.

Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates

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Bensheim, Germany

Berthold Ferstl