Bernt Narken

Title: **Innovations by Bernt Narken: Pioneering Semiconductor Technologies**

Introduction

Bernt Narken, an accomplished inventor based in Poughkeepsie, NY, has made significant contributions to the field of semiconductor technology. With two patented innovations to his name, Narken is recognized for his inventive skills and commitment to advancing technology. His work primarily focuses on enhancing the fabrication processes and efficiency of semiconductor devices.

Latest Patents

Narken's latest patents showcase his expertise and ingenuity in developing advanced materials and techniques. The first, the **Integrated Circuit Photomask**, involves a photomask made of a transparent dielectric substrate, such as glass and quartz-based substrates, featuring a conductive surface adjacent region. This mask is patterned with sequential overcoatings of a composite chrome oxide layer and a chrome film. The innovation ensures varied reflectivities to achieve the proper densities for the opaque areas of the mask, essential in semiconductor manufacturing.

The second patent, **Multilayered Glass-Ceramic Substrate for Mounting of Semiconductor Device**, presents a method for fabricating an interconnection package for multiple semiconductor chips. This process involves creating a multi-layered glass-ceramic superstructure with a distribution of conductors formed on a pre-formed glass-ceramic base. The technique consists of depositing conductor patterns and forming crystallizable glass dielectric layers which transform into glass-ceramic prior to adding further conductor patterns, thereby facilitating the production of a monolithic, compatible substrate. This innovation allows for electric connections to semiconductor chips through exposed conductor patterns at the top surface of the resultant package.

Career Highlights

Bernt Narken's career is notably linked with the **International Business Machines Corporation (IBM)**, where he has applied his inventive prowess. His tenure at IBM marks a significant period during which he has contributed to cutting-edge developments in semiconductor technologies. Narken’s innovations have not only advanced the company’s offerings but have also impacted the industry by pushing the boundaries of what is achievable in semiconductor design and manufacturing.

Collaborations

Throughout his career, Bernt Narken has collaborated with esteemed colleagues, such as Rao R. Tummala and Henry C. Schick. These collaborations have fostered an environment of shared knowledge and innovation, enhancing the creative processes involved in the development of Narken's patents and contributing to the success of their projects.

Conclusion

With his significant contributions to semiconductor technology, Bernt Narken continues to be recognized for his innovative mindset and technical expertise. His patents not only reflect his creative approach but also pave the way for future advancements in the field, solidifying his legacy as a prominent inventor in the industry.