Wappingers Falls, NY, United States of America

Bernhard Fiegl


Average Co-Inventor Count = 4.9

ph-index = 3

Forward Citations = 38(Granted Patents)


Location History:

  • Mechanicsville, VA (US) (1999)
  • Wappingers Falls, NY (US) (1998 - 2000)

Company Filing History:


Years Active: 1998-2000

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Bernhard Fiegl

Introduction

Bernhard Fiegl is a notable inventor based in Wappingers Falls, NY (US). He holds a total of 3 patents that showcase his expertise in semiconductor technology and device manufacturing. His work has significantly contributed to advancements in the field.

Latest Patents

Fiegl's latest patents include innovative methods for manufacturing self-aligned polysilicon FET devices. These devices are created using shallow trench isolation (STI) on a semiconductor substrate, which is coated with a pad. This process forms raised active silicon device areas and dummy active silicon mesas capped with pad structures on the doped silicon substrate. A conformal blanket silicon oxide layer is then deposited on the device, followed by a polysilicon film. The film is polished until the silicon oxide layer is exposed over the pad structures. Selective RIE partial etching of the conformal silicon oxide layer over the mesas is performed, followed by CMP planarization, converting the silicon oxide layer into a planar form.

Another significant patent involves methods for protecting device components from chemical mechanical polish (CMP) damage. This method prevents CMP-induced damage to a substrate located beneath a pad nitride layer of a mesa. The process includes planarizing the polysilicon layer down to the dielectric layer's surface and etching partially through the first region of the dielectric layer using selective etch parameters. This ensures that the pad nitride layer remains intact, even in the presence of CMP defects.

Career Highlights

Throughout his career, Bernhard Fiegl has worked with prominent companies such as IBM and Siemens Aktiengesellschaft. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Fiegl has collaborated with notable individuals in the field, including Max Gerald Levy and Walter Glashauser. These partnerships have contributed to the advancement of technology and innovation in semiconductor devices.

Conclusion

Bernhard Fiegl's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the future of device manufacturing.

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