Bernd Schönherr

Title: Bernd Schönherr: Innovator in Particle Beam Lithography

Introduction

Bernd Schönherr is a notable inventor based in Blaustein, Germany. He has made significant contributions to the field of particle beam lithography, particularly through his innovative methods that enhance the precision and efficiency of this technology.

Latest Patents

One of Schönherr's key patents is titled "Method for compensating for scatter/reflection effects in particle beam lithography." This patent outlines a method that includes several steps: providing at least one layer of a material sensitive to particle beams, using at least one particle beam to write predetermined patterns in a limited area of the material, and writing at least one frame surrounding the limited area. This approach ensures that variations in the background dose within the limited area are minimized, resulting in a more homogeneous background dose and reduced variation in critical dimensions.

Career Highlights

Bernd Schönherr is associated with Infineon Technologies AG, where he applies his expertise in particle beam lithography. His work has been instrumental in advancing the capabilities of this technology, making it more effective and cost-efficient for various applications.

Collaborations

Throughout his career, Schönherr has collaborated with talented professionals, including Christian Ebi and Frank Erber. These collaborations have contributed to the development of innovative solutions in the field of lithography.

Conclusion

Bernd Schönherr's contributions to particle beam lithography exemplify the impact of innovative thinking in technology. His patent and work at Infineon Technologies AG highlight his role as a key figure in advancing this important field.