This inventor holds 1 USPTO granted patent. Top assignee: Simon Fraser University. Active years: 1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1996
Title: Innovations of Bentley J Palmer
Introduction
Bentley J Palmer is an accomplished inventor based in Athens, GA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for creating patterned films. His innovative approach has the potential to impact various industries, including electronics and optics.
Latest Patents
One of Palmer's notable patents is titled "Method for directly depositing metal containing patterned films." This patent describes a photoresist-free method for making patterned films of metal oxides, metals, or other metal-containing compounds. The process involves applying an amorphous film of a metal complex to a substrate, which can be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low-temperature chemical reaction in the presence of light of a suitable wavelength. The resulting patterned film is generally planar, eliminating the need for separate planarization steps.
Career Highlights
Palmer's career is marked by his dedication to advancing material deposition techniques. His work has garnered attention for its innovative approach and practical applications. He is currently associated with Simon Fraser University, where he continues to contribute to research and development in his field.
Collaborations
Throughout his career, Palmer has collaborated with notable colleagues, including Ross Henry Hill and Alfred A Avey, Jr. These collaborations have further enriched his research and expanded the impact of his inventions.
Conclusion
Bentley J Palmer's contributions to the field of material science through his innovative patent demonstrate his commitment to advancing technology. His work continues to inspire future developments in the creation of patterned films.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
