Benson Po-Hsiang Chi

Title: **Benson Po-Hsiang Chi: Innovator in Chemical Mechanical Polishing**

Introduction

Benson Po-Hsiang Chi is a distinguished inventor based in Hsinchu County, Taiwan, recognized for his significant contributions to the field of material processing. With a focus on the innovative chemical mechanical polishing process, Benson has secured two patents that enhance the efficiency and effectiveness of tungsten substrate treatments.

Latest Patents

Benson's latest patents include a comprehensive chemical mechanical polishing composition and method specifically designed for tungsten substrates. These patents emphasize the formulation of a polishing composition that minimizes corrosion while improving the polishing process. The innovative composition consists of water, an oxidizing agent, a select polyethoxylated tallow amine, a dicarboxylic acid, a source of iron ions, a colloidal silica abrasive, and may include optional components like a pH adjusting agent and a biocide. The polishing method involves a specialized pad that ensures dynamic contact with the substrate while dispensing the polishing composition, allowing for optimal tungsten removal and corrosion inhibition.

Career Highlights

Benson is currently affiliated with Rohm and Haas Electronic Materials CMP Holdings, Inc., a prominent player in the electronic materials industry. His expertise in chemical processes and material science has contributed significantly to the advancement of technologies used in various electronic applications.

Collaborations

Throughout his career, Benson has collaborated with notable colleagues such as Jia De Peng and Lin-Chen Ho, fostering a collaborative environment that promotes innovation and excellence in research and development. These partnerships reflect his commitment to advancing technology through teamwork and shared expertise.

Conclusion

Benson Po-Hsiang Chi stands out as a remarkable inventor with a strong focus on enhancing chemical mechanical polishing techniques for tungsten materials. His patents not only demonstrate his innovative spirit but also contribute to addressing industry challenges in electronic materials processing. As he continues his work at Rohm and Haas Electronic Materials CMP Holdings, Inc., the impact of his inventions is likely to resonate within the field for years to come.