This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Intertechnique. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Benoît Estaca Sagot: Innovator in Mask Regulator Technology
Introduction
Benoît Estaca Sagot is a notable inventor based in Levallois-Perret, France. He has made significant contributions to the field of respiratory technology, particularly with his innovative designs in mask regulators. His work has implications for various applications, especially in aviation and medical fields.
Latest Patents
Benoît holds a patent for a "Demand and dilution mask regulator and method of regulating additional oxygen in the mask regulator." This invention features a demand and dilution mask regulator that includes an oxygen feed circuit and a dilution circuit for supplying air. The design incorporates a mixing chamber where the inhaled breathe-in air flow rate is measured through a capillary duct connected to a Venturi construction. The method of regulating the flow rate of additional oxygen utilizes flow rate data measured through the capillary duct to control the oxygen flow rate supplied to the mixing chamber. He has 1 patent to his name.
Career Highlights
Throughout his career, Benoît has worked with prominent companies in the aerospace and aeronautics sectors. Notable among these are Intertechnique and Zodiac Aerotechnics, where he contributed to advancements in technology related to mask regulators and other respiratory devices.
Collaborations
Benoît has collaborated with several professionals in his field, including Séverine Aubonnet and Patrick Maire. These collaborations have likely enriched his work and contributed to the development of innovative solutions in respiratory technology.
Conclusion
Benoît Estaca Sagot is a distinguished inventor whose work in mask regulator technology has made a significant impact. His innovative designs and collaborations continue to influence advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile