Benoît Butaye

Title: The Innovations of Benoît Butaye

Introduction

Benoît Butaye is a notable inventor based in Caen, France. He has made significant contributions to the field of integrated circuits, showcasing his expertise through his innovative designs and patents. His work is particularly recognized for its compactness and efficiency.

Latest Patents

Benoît Butaye holds a patent for an "Integrated circuit including an inductive element having a large quality factor and being highly compact." This invention features an integrated circuit that includes a substrate, a conductive layer, and at least one inductive element. The inductive element is formed by a metallic turn with an outer and inner contour, which defines a radiation surface. The design also incorporates insulating material to separate the conductive layer from the inductive element, ensuring optimal performance. The conductive layer is designed to have a surface that is substantially identical to the radiation surface, enhancing the circuit's efficiency.

Career Highlights

Benoît Butaye is currently employed at Koninklijke Philips Corporation N.V., where he continues to innovate and develop new technologies. His work at Philips has allowed him to collaborate with other talented professionals in the field, further advancing the company's research and development efforts.

Collaborations

One of his notable coworkers is Patrice Gamand, with whom he has likely shared insights and expertise in their respective projects. Their collaboration exemplifies the importance of teamwork in driving innovation within the technology sector.

Conclusion

Benoît Butaye's contributions to integrated circuit technology highlight his role as a leading inventor in the field. His patent reflects a commitment to innovation and efficiency, making a significant impact on the industry.