Caen, France

Benoît Butaye

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benoît Butaye. Retrieved from https://idiyas.com/inventor/benoandicirct-butaye

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Benoît Butaye: Innovator in Integrated Circuit Technology

Introduction

Benoît Butaye is a notable inventor based in Caen, France. He has made significant contributions to the field of integrated circuits, showcasing his expertise through his innovative patent.

Latest Patents

Benoît Butaye holds a patent for an "Integrated circuit including a low-dispersion capacitive network." This invention reflects his commitment to advancing technology in the electronics sector. He has 1 patent to his name, demonstrating his capability as an inventor.

Career Highlights

Benoît Butaye is currently employed at U.S. Philips Corporation, a leading company in the technology and electronics industry. His work at Philips has allowed him to engage in cutting-edge research and development, contributing to the company's reputation for innovation.

Collaborations

Benoît collaborates with Fabrice Jovenin, a fellow innovator. Their partnership exemplifies the collaborative spirit often found in research and development environments.

Conclusion

Benoît Butaye is a distinguished inventor whose work in integrated circuit technology has made a lasting impact. His contributions continue to influence advancements in the field, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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