Giv′at-Shmuel, Israel

Benny Naveh


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2013-2024

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Benny Naveh: Innovator in Pattern Transfer Technology

Introduction

Benny Naveh is a notable inventor based in Giv′at-Shmuel, Israel. He has made significant contributions to the field of pattern transfer technology, holding 2 patents that showcase his innovative approach to laser printing and drilling systems.

Latest Patents

Naveh's latest patents include a "Pattern Transfer Sheet, Method of Monitoring Pattern Transfer Printing," and a "Pattern Transfer Printing System." These inventions focus on monitoring and adjusting laser illumination used for transferring paste patterns from trenches on the sheets onto substrates such as electronic circuitry and solar cell substrates. The pattern transfer sheets are designed with trace marks that receive printing paste, which are aligned to the trenches and wider than the laser beam's width. This design helps detect misalignment of paste release. Additionally, the working window marks are set at specified offsets to correct the effective working window by adjusting the laser beam's power. Another significant patent is for a "Multiple Beam Drilling System," which details a method for laser drilling holes in a substrate with varying simultaneity, allowing for efficient and precise drilling.

Career Highlights

Throughout his career, Benny Naveh has worked with several prominent companies, including Orbotech Limited and Wuhan Dr Laser Technology Corporation. His experience in these organizations has contributed to his expertise in laser technology and pattern transfer systems.

Collaborations

Naveh has collaborated with notable professionals in his field, including Zvi Kotler and Hanina Golan. These partnerships have likely enhanced his innovative capabilities and contributed to the development of his patents.

Conclusion

Benny Naveh's work in pattern transfer technology exemplifies his commitment to innovation and excellence. His patents reflect a deep understanding of laser applications in various industries, making him a significant figure in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…