Dueren, Germany

Benno Zimmermann

This inventor holds 1 USPTO granted patent. Top assignee: Ecoclean Gmbh. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Benno Zimmermann: Innovator in Robotic Calibration

Introduction

Benno Zimmermann is a notable inventor based in Dueren, Germany. He has made significant contributions to the field of robotics, particularly in the area of robot calibration. His innovative approach has the potential to enhance the efficiency and accuracy of robotic operations in various work environments.

Latest Patents

Zimmermann holds a patent for a "Method for setting up and/or calibrating a robot." This method involves a systematic approach to calibrating robots positioned in operational sites. The process includes generating a routine for the robot at a simulation site, transmitting the routine to the robot's control unit, and executing the routine remotely. This allows for automatic processing without the need for operator intervention at the operation site.

Career Highlights

Benno Zimmermann is associated with Ecoclean GmbH, where he applies his expertise in robotics. His work focuses on developing methods that streamline robotic operations, making them more efficient and user-friendly. With a patent portfolio that includes one significant patent, Zimmermann continues to push the boundaries of robotic technology.

Collaborations

Zimmermann collaborates with talented professionals such as Michael Foerster and Ruediger Fritzen. These partnerships enhance the innovative capabilities within his work environment, fostering a culture of creativity and technological advancement.

Conclusion

Benno Zimmermann's contributions to robotic calibration exemplify the impact of innovation in technology. His patented methods are paving the way for more efficient robotic operations, showcasing the importance of continuous development in this field.

Profile summary based on public USPTO records.
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