Company Filing History:
Years Active: 1994
Title: The Innovative Contributions of Benjamin W. Fu
Introduction
Benjamin W. Fu is a notable inventor based in Cupertino, California. He has made significant contributions to the field of electroplating technology. His work focuses on enhancing the efficiency and uniformity of electroplating processes.
Latest Patents
One of his key inventions is a multi-compartment electroplating system. This system allows for the simultaneous electroplating of two or more objects, ensuring that the electrodeposited material is uniform in thickness and composition. The electroplating solution is circulated between a reservoir and a multi-compartment tank, which features a cathode-paddle-anode (CPA) assembly for each compartment. Each CPA assembly includes an anode, a cathode designed to hold a wafer, and a single thieving electrode that covers the compartment floor not occupied by the wafer. Additionally, the system incorporates a cover that houses a linear motor to drive all paddles in synchrony.
Career Highlights
Benjamin W. Fu is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to push the boundaries of electroplating technology and contribute to advancements in manufacturing processes.
Collaborations
He has collaborated with notable colleagues such as Panayotis Constantinou Andricacos and Moritz Branger. Their combined expertise has further enriched the innovative environment at IBM.
Conclusion
Benjamin W. Fu's contributions to electroplating technology exemplify the impact of innovation in manufacturing. His patented multi-compartment electroplating system represents a significant advancement in the field.