Brunoy, France

Benjamin Vouhe

This inventor holds 1 USPTO granted patent. Top assignee: Oce Holding B.v.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benjamin Vouhe. Retrieved from https://idiyas.com/inventor/benjamin-vouhe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Benjamin Vouhe: Innovator in Printing Technology

Introduction

Benjamin Vouhe is a notable inventor based in Brunoy, France. He has made significant contributions to the field of printing technology, particularly with his innovative printing system designed for printing multiple images on a web.

Latest Patents

Benjamin Vouhe holds 1 patent for his invention titled "Printing system for printing a plurality of images on a web and a method thereof." This invention relates to a sophisticated printing system that includes a print engine, a feeder for supplying the web, and a receiver for collecting the printed web. The system is equipped with a user interface that allows users to set the printing arrangement of images and a scheduling module that optimizes the placement of these images on the web.

Career Highlights

Benjamin Vouhe is currently employed at Océ Holding B.V., a company known for its advancements in printing technology. His work focuses on enhancing the efficiency and effectiveness of printing systems, contributing to the evolution of the industry.

Collaborations

Throughout his career, Benjamin has collaborated with talented individuals such as Lioudmila Semouchine and Vincent Leymarie. These collaborations have fostered innovation and creativity in their projects.

Conclusion

Benjamin Vouhe's contributions to printing technology exemplify the spirit of innovation. His patent and work at Océ Holding B.V. highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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