This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: The Innovations of Benjamin Teh-Kung Chen: A Scholar in Emulsion Technology
Introduction: Benjamin Teh-Kung Chen, a notable inventor based in Penfield, NY, has made a significant contribution to the field of emulsions through his innovative work. With one patent to his name, he has demonstrated a keen understanding of chemical formulations that enhance product performance. Currently, he is associated with the esteemed Eastman Kodak Company, where he collaborates with fellow inventor Roger L. Lok.
Latest Patents: Benjamin Chen holds a patent for a "High chloride emulsion having high sensitivity and low fog." This inventive solution addresses common issues encountered in various imaging processes, making it a valuable asset in the field of photography and related technologies.
Career Highlights: Throughout his career at Eastman Kodak Company, Benjamin has focused on advancing emulsion chemistry. His dedication to research and development has helped pave the way for enhanced photographic materials that provide improved clarity and sensitivity to light, further solidifying Kodak's reputation as a leader in imaging technology.
Collaborations: Benjamin's collaboration with Roger L. Lok has been instrumental in his work on emulsions. Together, they have explored new formulations and techniques, contributing to innovative solutions that benefit their company's product line and the industry as a whole.
Conclusion: Benjamin Teh-Kung Chen exemplifies the spirit of innovation within the Eastman Kodak Company. His patent for a high chloride emulsion showcases his commitment to improving imaging technology. As he continues to work alongside talented colleagues like Roger L. Lok, Benjamin's inventions remain at the forefront of advancements in the field.