Cambridge, MA, United States of America

Benjamin Miller

This inventor holds 2 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Massachusetts Institute of Technology, Samsung Electronics Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benjamin Miller. Retrieved from https://idiyas.com/inventor/benjamin-miller-zlqvonze

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Benjamin Miller

Introduction

Benjamin Miller is an accomplished inventor based in Cambridge, MA. He is known for his significant contributions to the field of photonic materials. His innovative work focuses on materials that can change color in response to mechanical deformation.

Latest Patents

Miller holds a patent for "Deformable Photonic Materials and Related Methods." This patent describes photonic materials that reversibly change color when stretched or otherwise mechanically deformed. This technology has potential applications in various fields, including sensors and displays.

Career Highlights

Miller is affiliated with the Massachusetts Institute of Technology, where he conducts research and develops new technologies. His work has garnered attention for its potential to revolutionize how materials interact with light and mechanical forces.

Collaborations

Miller collaborates with Mathias Kolle, a fellow researcher at MIT. Together, they explore the possibilities of photonic materials and their applications in modern technology.

Conclusion

Benjamin Miller's innovative work in deformable photonic materials showcases the intersection of science and technology. His contributions have the potential to impact various industries significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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