Benjamin M Ocko

Title: The Innovative Contributions of Benjamin M Ocko

Introduction

Benjamin M Ocko is a notable inventor based in Stony Brook, NY (US). He has made significant contributions to the field of materials science, particularly in the development of superhydrophobic surfaces. His innovative work has led to advancements in methods and systems for etching nanostructures in substrates.

Latest Patents

Ocko holds a patent for the "Formation of superhydrophobic surfaces." This patent describes technologies for effective methods and systems for etching nanostructures in a substrate. The methods involve depositing a patterned block copolymer on the substrate and applying a precursor to generate an infiltrated block copolymer. The process includes removing polymer block domains to create a pattern of material, which masks the substrate during etching. This innovative approach allows for the production of nanostructures in the substrate, followed by the application of a hydrophobic coating.

Career Highlights

Benjamin M Ocko is associated with Brookhaven Science Associates, LLC, where he continues to explore and develop cutting-edge technologies. His work has been instrumental in advancing the understanding and application of nanostructured materials.

Collaborations

Ocko has collaborated with esteemed colleagues such as Antonio Checco and Charles Thomas Black. These partnerships have fostered a collaborative environment that enhances innovation and research in their respective fields.

Conclusion

Benjamin M Ocko's contributions to the field of materials science, particularly through his patent on superhydrophobic surfaces, highlight his role as a leading inventor. His work continues to influence advancements in nanotechnology and materials engineering.