Zurich, Switzerland

Benjamin Müller

This inventor holds 1 USPTO granted patent. Top assignee: Evatec Ag. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benjamin Müller. Retrieved from https://idiyas.com/inventor/benjamin-müller-ex8mk7yx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Benjamin Müller

Introduction

Benjamin Müller is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of vacuum treatment technology. His work focuses on enhancing manufacturing processes for vacuum-treated substrates.

Latest Patents

Müller holds a patent for a "Vacuum treatment apparatus and methods for manufacturing vacuum treated substrates." This innovative apparatus allows substrates supported in substrate holders to be carried on holder carriers. The design ensures that their extended surfaces are exposed to the surrounding atmosphere along the extended surface of the holder carriers. The vacuum treatment chamber communicates via a gate valve with a transfer vacuum chamber, facilitating efficient substrate treatment.

Career Highlights

Müller is currently employed at Evatec AG, a company known for its advanced vacuum technology solutions. His expertise in vacuum treatment has positioned him as a key player in the industry. With a focus on innovation, he continues to develop methods that improve manufacturing efficiency.

Collaborations

Müller collaborates with talented coworkers, including Marco Stupan and Lukas Epprecht. Together, they work on advancing the technology and applications of vacuum treatment processes.

Conclusion

Benjamin Müller is a pioneering inventor whose work in vacuum treatment technology has made a significant impact on manufacturing processes. His contributions continue to shape the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…