San Jose, CA, United States of America

Benjamin L Wang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2004-2009

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4 patents (USPTO):Explore Patents

Title: Innovations by Inventor Benjamin L. Wang

Introduction: Benjamin L. Wang, based in San Jose, California, is a recognized inventor renowned for his significant contributions to the fields of technology and materials engineering. With a total of four patents to his name, Wang has demonstrated a commitment to pushing the boundaries of innovation.

Latest Patents: Among his latest patents, one focuses on a method of plating using a polymeric barrier layer that includes a unique polyphenolic polymer. This method allows for enhanced control over plating processes, offering potential applications in various technology sectors. Another notable patent details a method of fabricating a narrow projection, specifically designed for magnetic recording heads. This technique ensures that the projection has precise dimensions, enhancing the efficiency and effectiveness of the write pole in recording devices.

Career Highlights: Over his professional journey, Benjamin L. Wang has worked with prestigious organizations, including IBM and Hitachi Global Storage Technologies. His innovative approach in these roles has significantly contributed to advancements in data storage and processing technologies.

Collaborations: Throughout his career, Wang has had the opportunity to collaborate with notable colleagues, including James Bernard Kruger and Patrick Rush Webb. These collaborations have played a vital role in the development of his innovative ideas, leading to impactful patents.

Conclusion: Benjamin L. Wang continues to be an influential figure in the realm of technology and innovation. His dedication to improving existing methods and creating new solutions reflects his status as a leading inventor in the field. As he continues to innovate, his contributions will undoubtedly shape future advancements in technology.

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