The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2005

Filed:

Apr. 12, 2002
Applicants:

James Kruger, Half Moon Bay, CA (US);

Benjamin L. Wang, San Jose, CA (US);

Patrick R. Webb, San Jose, CA (US);

Howard G. Zolla, San Jose, CA (US);

Inventors:

James Kruger, Half Moon Bay, CA (US);

Benjamin L. Wang, San Jose, CA (US);

Patrick R. Webb, San Jose, CA (US);

Howard G. Zolla, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B005/187 ; B44C001/22 ; C23C014/04 ;
U.S. Cl.
CPC ...
Abstract

An article is formed as a substrate having a projection extending outwardly therefrom. The article may be a magnetic recording head and the projection a write pole. The projection has a width in a thinnest dimension measured parallel to a substrate surface of no more than about 0.3 micrometers and a height measured perpendicular to the substrate of not less than about 5 times the width. The article is fabricated by forming an overlying structure on the substrate with an edge thereon, depositing a replication layer lying on the edge, depositing a filler onto the edge and the substrate, so that the filler, the replication layer, and the overlying structure in combination comprise a continuous layer on the substrate, selectively removing at least a portion of the replication layer from a free surface of the continuous layer inwardly toward the substrate, to form a defined cavity, and depositing a projection material into the defined cavity to form the projection.


Find Patent Forward Citations

Loading…