Fenton, MI, United States of America

Benjamin K Bosworth

This inventor holds 1 USPTO granted patent. Top assignee: Pratt & Miller Engineering and Fabrication, Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benjamin K Bosworth. Retrieved from https://idiyas.com/inventor/benjamin-k-bosworth

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Benjamin K. Bosworth: Vehicle Restraint-System Inventor

Introduction

Benjamin K. Bosworth is an inventor based in Fenton, Michigan. His work includes a patented vehicle restraint system designed to protect occupants while allowing hands-free operation.

Latest Patents

Bosworth is credited with 1 patent: “Restraint System, Optionally Hands Free.” The invention describes a restraint system for a manned vehicle that may be actuated automatically, without requiring occupants to operate it. It can include an upper restraint and one or more secondary restraint devices, such as an airbag or belt system. A manual override allows an occupant to exit when necessary, even if automated settings would otherwise keep the restraints locked.

Career Highlights

Bosworth is associated with Pratt & Miller Engineering and Fabrication, Inc. His patented work addresses vehicle occupant protection through a system that combines automated restraint operation with a manual override.

Collaborations

Bosworth’s listed coworkers include Steven G. Reini and Erik Hardy. Their shared professional context connects them with engineering and fabrication work at Pratt & Miller.

Conclusion

Benjamin K. Bosworth’s patent presents a vehicle restraint concept that combines hands-free, potentially automated protection with a manual means of exit.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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