Oshkosh, WI, United States of America

Benjamin C Bruno

This inventor holds 5 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Oshkosh Corporation. Active years: 2022-2025.

USPTO Granted Patents = 5 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of Benjamin C Bruno

Introduction

Benjamin C Bruno is a notable inventor based in Oshkosh, WI (US). He has made significant contributions to the field of lift devices, holding a total of 5 patents. His work focuses on enhancing the functionality and efficiency of scissor lift mechanisms.

Latest Patents

Among his latest innovations is the "Scissor lift with middle pin offset and kicker." This invention features a lift device that includes a base, a platform, and a scissor assembly that couples the two. The scissor assembly consists of multiple layers, each designed to improve the lift's operational capabilities. Another notable patent is the "Scissor lift with offset pins," which also incorporates a scissor assembly that connects a base to a platform. This design emphasizes the importance of the middle axis offset, enhancing the lift's performance.

Career Highlights

Benjamin C Bruno is currently employed at Oshkosh Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of lift devices, making them safer and more efficient for various applications.

Collaborations

He has collaborated with talented coworkers such as Devin J Rosencrance and Mark G Neubauer, contributing to a dynamic and innovative work environment.

Conclusion

Benjamin C Bruno's contributions to the field of lift devices exemplify his commitment to innovation and engineering excellence. His patents reflect a deep understanding of mechanical design and functionality, making a lasting impact in the industry.

Profile summary based on public USPTO records.
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